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Chamber Cleaning

Designed to clean dielectric film buildup from chemical vapor deposition (CVD) chambers, these products offer a number of important performance and environmental advantages:

  • Helps reduce costs through reduced gas usage w/o sacrificing etch rate
  • Helps reduce PFC gas emissions
  • Allows use of existing gaslines and controllers

Chamber Cleaning Product Families
3M™ Specialty Gases

3M™ Specialty Gases

"Drop-in" replacements for C2F6 offering advantages such as reduced costs through reduced gas usage and reduced PFC gas emissions.